Analysis of subthreshold photo-leakage current in ZnO thin-film transistors using indium-ion implantation
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چکیده
منابع مشابه
Leakage Current Calibration Procedures of Amorphous Silicon Thin-Film Transistors
Figure 1. (a) Trap occupancy of a trapping level under non-equilibrium conditions (b) probability of occupation (c) conceptual diagram of DOS, probability of occupation, and ionized densities in the a-Si TFTs. Figure 2. Examples of ATLAS simulation results with DEFECT and SAVE TRAP.FILE statements. Introduction Amorphous silicon Thin-Film Transistors (a-Si TFTs) are widely used as the switching...
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ژورنال
عنوان ژورنال: Solid-State Electronics
سال: 2010
ISSN: 0038-1101
DOI: 10.1016/j.sse.2010.04.001